Electron microscopy analysis of microstructure of postannealed aluminum nitride template
The microstructure of an AlN template after high-temperature annealing was investigated by transmission electron microscopy (TEM). The AlN template was prepared by depositing an AlN layer of about 200nm thickness on a sapphire (0001) substrate by metal-organic vapor phase epitaxy. The AlN template w...
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Japan Society of Applied Physics
2016
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my.utm.716172017-11-20T08:28:24Z http://eprints.utm.my/id/eprint/71617/ Electron microscopy analysis of microstructure of postannealed aluminum nitride template Kaur, J. Kuwano, N. Jamaludin, K. R. Mitsuhara, M. Saito, H. Hata, S. Suzuki, S. Miyake, H. Hiramatsu, K. Fukuyama, H. T Technology (General) The microstructure of an AlN template after high-temperature annealing was investigated by transmission electron microscopy (TEM). The AlN template was prepared by depositing an AlN layer of about 200nm thickness on a sapphire (0001) substrate by metal-organic vapor phase epitaxy. The AlN template was annealed under (N2 + CO) atmosphere at 1500-1650 °C. TEM characterization was conducted to investigate the microstructural evolution, revealing that the postannealed AlN has a two-layer structure, the upper and lower layers of which exhibit Al and N polarities, respectively. It has been confirmed that postannealing is an effective treatment for controlling the microstructure. Japan Society of Applied Physics 2016 Article PeerReviewed Kaur, J. and Kuwano, N. and Jamaludin, K. R. and Mitsuhara, M. and Saito, H. and Hata, S. and Suzuki, S. and Miyake, H. and Hiramatsu, K. and Fukuyama, H. (2016) Electron microscopy analysis of microstructure of postannealed aluminum nitride template. Applied Physics Express, 9 (6). ISSN 1882-0778 https://www.scopus.com/inward/record.uri?eid=2-s2.0-84973454810&doi=10.7567%2fAPEX.9.065502&partnerID=40&md5=56c20b61c46154e7ae2e411768a0a731 |
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T Technology (General) Kaur, J. Kuwano, N. Jamaludin, K. R. Mitsuhara, M. Saito, H. Hata, S. Suzuki, S. Miyake, H. Hiramatsu, K. Fukuyama, H. Electron microscopy analysis of microstructure of postannealed aluminum nitride template |
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The microstructure of an AlN template after high-temperature annealing was investigated by transmission electron microscopy (TEM). The AlN template was prepared by depositing an AlN layer of about 200nm thickness on a sapphire (0001) substrate by metal-organic vapor phase epitaxy. The AlN template was annealed under (N2 + CO) atmosphere at 1500-1650 °C. TEM characterization was conducted to investigate the microstructural evolution, revealing that the postannealed AlN has a two-layer structure, the upper and lower layers of which exhibit Al and N polarities, respectively. It has been confirmed that postannealing is an effective treatment for controlling the microstructure. |
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Article |
author |
Kaur, J. Kuwano, N. Jamaludin, K. R. Mitsuhara, M. Saito, H. Hata, S. Suzuki, S. Miyake, H. Hiramatsu, K. Fukuyama, H. |
author_facet |
Kaur, J. Kuwano, N. Jamaludin, K. R. Mitsuhara, M. Saito, H. Hata, S. Suzuki, S. Miyake, H. Hiramatsu, K. Fukuyama, H. |
author_sort |
Kaur, J. |
title |
Electron microscopy analysis of microstructure of postannealed aluminum nitride template |
title_short |
Electron microscopy analysis of microstructure of postannealed aluminum nitride template |
title_full |
Electron microscopy analysis of microstructure of postannealed aluminum nitride template |
title_fullStr |
Electron microscopy analysis of microstructure of postannealed aluminum nitride template |
title_full_unstemmed |
Electron microscopy analysis of microstructure of postannealed aluminum nitride template |
title_sort |
electron microscopy analysis of microstructure of postannealed aluminum nitride template |
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Japan Society of Applied Physics |
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2016 |
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http://eprints.utm.my/id/eprint/71617/ https://www.scopus.com/inward/record.uri?eid=2-s2.0-84973454810&doi=10.7567%2fAPEX.9.065502&partnerID=40&md5=56c20b61c46154e7ae2e411768a0a731 |
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13.18916 |