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Carbon thin films deposition by KRF pulsed laser at different temperatures

The surface morphology of carbon thin films deposited at temperatures 20°C and 300°C have been done by Atomic Force Microscope (AFM). The 10,000 pulses of KrF Excimer laser of wavelength 248 nm, pulse energy 13-50 mJ and pulse width 20 ns was focused at an angle of 45° to ablate pure graphite target...

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Main Authors: Qindeel, Rabia, Ali, Jalil, Hussain, M. S., Chaudhary, K. T.
Format: Article
Published: Institute of Electrical and Electronics Engineers 2011
Subjects:
TP Chemical technology
Online Access:http://eprints.utm.my/id/eprint/44770/
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spelling my.utm.447702017-09-12T08:37:53Z http://eprints.utm.my/id/eprint/44770/ Carbon thin films deposition by KRF pulsed laser at different temperatures Qindeel, Rabia Ali, Jalil Hussain, M. S. Chaudhary, K. T. TP Chemical technology The surface morphology of carbon thin films deposited at temperatures 20°C and 300°C have been done by Atomic Force Microscope (AFM). The 10,000 pulses of KrF Excimer laser of wavelength 248 nm, pulse energy 13-50 mJ and pulse width 20 ns was focused at an angle of 45° to ablate pure graphite target. Silicon (111) was used as a substrate to deposit carbon thin film and placed at distance of 15 mm from the target surface. The whole experiment has been performed under vacuum ~ 10-4 Torr in stainless steel vacuum chamber. The nature of bonding of carbon thin films deposited at different temperatures has been done by using technique Fourier Infrared Transformation Spectroscopy (FTIR). Results obtained from AFM and FTIR support each other and explain the effect of substrate temperature on thin films deposition. Institute of Electrical and Electronics Engineers 2011 Article PeerReviewed Qindeel, Rabia and Ali, Jalil and Hussain, M. S. and Chaudhary, K. T. (2011) Carbon thin films deposition by KRF pulsed laser at different temperatures. Enabling Science and Nanotechnology, 1341 . pp. 199-204. ISSN 0929-6212
institution Universiti Teknologi Malaysia
building UTM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Teknologi Malaysia
content_source UTM Institutional Repository
url_provider http://eprints.utm.my/
topic TP Chemical technology
spellingShingle TP Chemical technology
Qindeel, Rabia
Ali, Jalil
Hussain, M. S.
Chaudhary, K. T.
Carbon thin films deposition by KRF pulsed laser at different temperatures
description The surface morphology of carbon thin films deposited at temperatures 20°C and 300°C have been done by Atomic Force Microscope (AFM). The 10,000 pulses of KrF Excimer laser of wavelength 248 nm, pulse energy 13-50 mJ and pulse width 20 ns was focused at an angle of 45° to ablate pure graphite target. Silicon (111) was used as a substrate to deposit carbon thin film and placed at distance of 15 mm from the target surface. The whole experiment has been performed under vacuum ~ 10-4 Torr in stainless steel vacuum chamber. The nature of bonding of carbon thin films deposited at different temperatures has been done by using technique Fourier Infrared Transformation Spectroscopy (FTIR). Results obtained from AFM and FTIR support each other and explain the effect of substrate temperature on thin films deposition.
format Article
author Qindeel, Rabia
Ali, Jalil
Hussain, M. S.
Chaudhary, K. T.
author_facet Qindeel, Rabia
Ali, Jalil
Hussain, M. S.
Chaudhary, K. T.
author_sort Qindeel, Rabia
title Carbon thin films deposition by KRF pulsed laser at different temperatures
title_short Carbon thin films deposition by KRF pulsed laser at different temperatures
title_full Carbon thin films deposition by KRF pulsed laser at different temperatures
title_fullStr Carbon thin films deposition by KRF pulsed laser at different temperatures
title_full_unstemmed Carbon thin films deposition by KRF pulsed laser at different temperatures
title_sort carbon thin films deposition by krf pulsed laser at different temperatures
publisher Institute of Electrical and Electronics Engineers
publishDate 2011
url http://eprints.utm.my/id/eprint/44770/
_version_ 1643651539943817216
score 13.2014675

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