Deposition of Micro Contact Based Probe Cell for IC Testing by Dc Magnetron Sputtering Technique
This study presents the deposition of micro contact probe cell for IC testing deposited by dc sputtering technique on a glass substrate. Micro contact with thickness of 2800-7000 nm were deposited from Copper target at sputtering power of 125 W in argon ambient at a room temperature on a base la...
Saved in:
Main Authors: | , , , |
---|---|
Format: | Article |
Language: | English |
Published: |
Maxwell Scientific Publications
2014
|
Subjects: | |
Online Access: | http://eprints.utem.edu.my/id/eprint/12547/1/v7-2701-2704.pdf http://eprints.utem.edu.my/id/eprint/12547/ |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Summary: | This study presents the deposition of micro contact probe cell for IC testing deposited by dc sputtering
technique on a glass substrate. Micro contact with thickness of 2800-7000 nm were deposited from Copper target at
sputtering power of 125 W in argon ambient at a room temperature on a base layer of copper using mask. Then, the
micro contacts were investigated by using profilometer. All the obtained results show the potential viability of the
novel test fixture and thus solve the limitation |
---|