Modelling of sacrificial spin-on glass (SOG) etching in non-straight microchannels using hydrofluoric acid
This paper studies spin-on glass (SOG) etching in T-shaped microchannels using hydrofluoric acid (HF). An etching model based on non-first order chemical reaction/steady-state diffusion sacrificial layer etching mechanism is presented to compensate for the etching effect at channel junction. Microch...
Saved in:
| Main Authors: | , , |
|---|---|
| Format: | |
| Published: |
2017
|
| Online Access: | http://dspace.uniten.edu.my:8080/jspui/handle/123456789/5318 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|