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Scaling down of the 32 nm to 22 nm gate length NMOS transistor

In this paper, we provide the downscaling design and simulation of NMOS transistor with 22 nm gate length, based on the 32 nm design simulation from our previous research. A combination Titanium dioxide (TiO2) was used as the high-k material and tungsten silicide (WSix) was used as the metal gate in...

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Main Authors: Afifah Maheran, A.H., Menon, P.S., Ahmad, I., Elgomati, H.A., Majlis, B.Y., Salehuddin, F.
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Published: 2017
Online Access:http://dspace.uniten.edu.my:8080/jspui/handle/123456789/5224
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spelling my.uniten.dspace-52242017-11-15T02:56:46Z Scaling down of the 32 nm to 22 nm gate length NMOS transistor Afifah Maheran, A.H. Menon, P.S. Ahmad, I. Elgomati, H.A. Majlis, B.Y. Salehuddin, F. In this paper, we provide the downscaling design and simulation of NMOS transistor with 22 nm gate length, based on the 32 nm design simulation from our previous research. A combination Titanium dioxide (TiO2) was used as the high-k material and tungsten silicide (WSix) was used as the metal gate instead of SiO2 dielectric from the 32 nm gate length device. The NMOS transistor was simulated using fabrication tool ATHENA and electrical characterization was simulated using ATLAS. The scale down ratio was used and the dimension of device was scaled down with minimal issues. Our simulation shows that the optimal value of threshold voltage (Vth) and leakage currents (Ion and Ioff) was achieved according to specification in ITRS 2011. This provides a benchmark towards the fabrication of 22 nm NMOS in future work. © 2012 IEEE. 2017-11-15T02:56:46Z 2017-11-15T02:56:46Z 2012 http://dspace.uniten.edu.my:8080/jspui/handle/123456789/5224
institution Universiti Tenaga Nasional
building UNITEN Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Tenaga Nasional
content_source UNITEN Institutional Repository
url_provider http://dspace.uniten.edu.my/
description In this paper, we provide the downscaling design and simulation of NMOS transistor with 22 nm gate length, based on the 32 nm design simulation from our previous research. A combination Titanium dioxide (TiO2) was used as the high-k material and tungsten silicide (WSix) was used as the metal gate instead of SiO2 dielectric from the 32 nm gate length device. The NMOS transistor was simulated using fabrication tool ATHENA and electrical characterization was simulated using ATLAS. The scale down ratio was used and the dimension of device was scaled down with minimal issues. Our simulation shows that the optimal value of threshold voltage (Vth) and leakage currents (Ion and Ioff) was achieved according to specification in ITRS 2011. This provides a benchmark towards the fabrication of 22 nm NMOS in future work. © 2012 IEEE.
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author Afifah Maheran, A.H.
Menon, P.S.
Ahmad, I.
Elgomati, H.A.
Majlis, B.Y.
Salehuddin, F.
spellingShingle Afifah Maheran, A.H.
Menon, P.S.
Ahmad, I.
Elgomati, H.A.
Majlis, B.Y.
Salehuddin, F.
Scaling down of the 32 nm to 22 nm gate length NMOS transistor
author_facet Afifah Maheran, A.H.
Menon, P.S.
Ahmad, I.
Elgomati, H.A.
Majlis, B.Y.
Salehuddin, F.
author_sort Afifah Maheran, A.H.
title Scaling down of the 32 nm to 22 nm gate length NMOS transistor
title_short Scaling down of the 32 nm to 22 nm gate length NMOS transistor
title_full Scaling down of the 32 nm to 22 nm gate length NMOS transistor
title_fullStr Scaling down of the 32 nm to 22 nm gate length NMOS transistor
title_full_unstemmed Scaling down of the 32 nm to 22 nm gate length NMOS transistor
title_sort scaling down of the 32 nm to 22 nm gate length nmos transistor
publishDate 2017
url http://dspace.uniten.edu.my:8080/jspui/handle/123456789/5224
_version_ 1644493620514914304
score 13.214268

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