Investigation of the effect of anodization time and annealing temperature on the physical properties of ZrO2 thin film on a Si substrate

Annealing; Grain size and shape; Morphology; Scanning electron microscopy; Silica; Silicon; Sodium hydroxide; Sputtering; Zircon; Zirconia; Annealed samples; Annealing temperatures; Anodization process; Anodization time; Anodizations; Fourier transform infrared microscopies; Scherrer equations; ZrO2...

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Main Authors: Goh K.H., Lee H.J., Lau S.K., Teh P.C., Ramesh S., Tan C.Y., Wong Y.H.
Other Authors: 57069579300
Format: Article
Published: Institute of Physics Publishing 2023
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spelling my.uniten.dspace-231462023-05-29T14:38:00Z Investigation of the effect of anodization time and annealing temperature on the physical properties of ZrO2 thin film on a Si substrate Goh K.H. Lee H.J. Lau S.K. Teh P.C. Ramesh S. Tan C.Y. Wong Y.H. 57069579300 57190622221 57193418930 57193423703 7103211834 16029485400 36605495300 Annealing; Grain size and shape; Morphology; Scanning electron microscopy; Silica; Silicon; Sodium hydroxide; Sputtering; Zircon; Zirconia; Annealed samples; Annealing temperatures; Anodization process; Anodization time; Anodizations; Fourier transform infrared microscopies; Scherrer equations; ZrO2; Thin films This research work studied the effects of various anodization times (5, 10, 15, 20 and 25 min) and various annealing temperatures (500, 600, 700, 800 and 900 �C) on ZrO2 thin film on a Si substrate. The ZrO2 thin film was prepared via sputtering and anodization processes on a Si substrate. The existence of Si, SiO2, m-ZrO2, t-ZrO2 and ZrSiO4 was confirmed by x-ray diffraction, Fourier transform infrared microscopy and Raman spectroscopy. In addition, NaOH was observed as a residue on the surface of the thin film. The grain size and microstrain of both m-ZrO2, and t-ZrO2 were calculated using the Williamson-Hall and/or Scherrer equation. The morphology of samples was examined by scanning electron microscopy. In contrast to unannealed samples, the annealed samples have a smaller grain size, less NaOH, and SiO2 with a smoother surface. However, the SiO2 existed when being annealed at higher temperatures (?800 �C). � 2017 IOP Publishing Ltd. Final 2023-05-29T06:38:00Z 2023-05-29T06:38:00Z 2017 Article 10.1088/2053-1591/aa824e 2-s2.0-85029161357 https://www.scopus.com/inward/record.uri?eid=2-s2.0-85029161357&doi=10.1088%2f2053-1591%2faa824e&partnerID=40&md5=82a1ee9ed77770b6109e042ff637bb3b https://irepository.uniten.edu.my/handle/123456789/23146 4 8 86414 Institute of Physics Publishing Scopus
institution Universiti Tenaga Nasional
building UNITEN Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Tenaga Nasional
content_source UNITEN Institutional Repository
url_provider http://dspace.uniten.edu.my/
description Annealing; Grain size and shape; Morphology; Scanning electron microscopy; Silica; Silicon; Sodium hydroxide; Sputtering; Zircon; Zirconia; Annealed samples; Annealing temperatures; Anodization process; Anodization time; Anodizations; Fourier transform infrared microscopies; Scherrer equations; ZrO2; Thin films
author2 57069579300
author_facet 57069579300
Goh K.H.
Lee H.J.
Lau S.K.
Teh P.C.
Ramesh S.
Tan C.Y.
Wong Y.H.
format Article
author Goh K.H.
Lee H.J.
Lau S.K.
Teh P.C.
Ramesh S.
Tan C.Y.
Wong Y.H.
spellingShingle Goh K.H.
Lee H.J.
Lau S.K.
Teh P.C.
Ramesh S.
Tan C.Y.
Wong Y.H.
Investigation of the effect of anodization time and annealing temperature on the physical properties of ZrO2 thin film on a Si substrate
author_sort Goh K.H.
title Investigation of the effect of anodization time and annealing temperature on the physical properties of ZrO2 thin film on a Si substrate
title_short Investigation of the effect of anodization time and annealing temperature on the physical properties of ZrO2 thin film on a Si substrate
title_full Investigation of the effect of anodization time and annealing temperature on the physical properties of ZrO2 thin film on a Si substrate
title_fullStr Investigation of the effect of anodization time and annealing temperature on the physical properties of ZrO2 thin film on a Si substrate
title_full_unstemmed Investigation of the effect of anodization time and annealing temperature on the physical properties of ZrO2 thin film on a Si substrate
title_sort investigation of the effect of anodization time and annealing temperature on the physical properties of zro2 thin film on a si substrate
publisher Institute of Physics Publishing
publishDate 2023
_version_ 1806424099971399680
score 13.214268