Mask Making Process (Positive and Negative Mask)

• Main Authors: Uda, Hashim, Prof. Dr., Nur Hamidah, Abdul Halim, Mohamad Nuzaihan, Md Nor, Zul Azhar, Zahid Jamal, Prof. Dr.
• Other Authors: [e-mail]
• Format: Image
• Language: English
• Published: Kementerian Pengajian Tinggi Malaysia (KPTM) 2010
• Subjects: Mask; E-beam lithography (EBL); EBL System; UniMAP > Research and development; UniMAP > Exhibition; PECIPTA 2007
• Online Access: http://dspace.unimap.edu.my/xmlui/handle/123456789/8172

PECIPTA 2007 dianjurkan oleh Kementerian Pengajian Tinggi Malaysia (KPTM) dengan kerjasama Universiti Sains Malaysia (USM) pada 10 - 12 Ogos 2007 di Pusat Konvensyen Kuala Lumpur (KLCC), Kuala Lumpur.