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Mask Making Process (Positive and Negative Mask)

PECIPTA 2007 dianjurkan oleh Kementerian Pengajian Tinggi Malaysia (KPTM) dengan kerjasama Universiti Sains Malaysia (USM) pada 10 - 12 Ogos 2007 di Pusat Konvensyen Kuala Lumpur (KLCC), Kuala Lumpur.

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Bibliographic Details
Main Authors: Uda, Hashim, Prof. Dr., Nur Hamidah, Abdul Halim, Mohamad Nuzaihan, Md Nor, Zul Azhar, Zahid Jamal, Prof. Dr.
Other Authors: uda@unimap.edu.my
Format: Image
Language:English
Published: Kementerian Pengajian Tinggi Malaysia (KPTM) 2010
Subjects:
Mask
E-beam lithography (EBL)
EBL System
UniMAP > Research and development
UniMAP > Exhibition
PECIPTA 2007
Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/8172
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spelling my.unimap-81722010-06-22T08:24:24Z Mask Making Process (Positive and Negative Mask) Uda, Hashim, Prof. Dr. Nur Hamidah, Abdul Halim Mohamad Nuzaihan, Md Nor Zul Azhar, Zahid Jamal, Prof. Dr. uda@unimap.edu.my Mask E-beam lithography (EBL) EBL System UniMAP -- Research and development UniMAP -- Exhibition PECIPTA 2007 PECIPTA 2007 dianjurkan oleh Kementerian Pengajian Tinggi Malaysia (KPTM) dengan kerjasama Universiti Sains Malaysia (USM) pada 10 - 12 Ogos 2007 di Pusat Konvensyen Kuala Lumpur (KLCC), Kuala Lumpur. Generally, two types of masks are used in MOSFET fabrication; positive mask and negative mask. These resists mask can be used either in lift off process or conventional lithography step depends on the fabrication process requirement. To achieve good resolution, Scanning Electron Microscopy (SEM) based E-beam lithography (EBL) was used to transfer the patern according the design. The patern was design in GDSII Editor in EBL System. Positive resist, Poly-methly-metacrylate (PMMA) and Negative resist, maN2403 were used as a resist in the EBL. 2010-06-22T08:24:24Z 2010-06-22T08:24:24Z 2007-08-10 Image http://hdl.handle.net/123456789/8172 en PECIPTA 2007 Kementerian Pengajian Tinggi Malaysia (KPTM)
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Mask
E-beam lithography (EBL)
EBL System
UniMAP -- Research and development
UniMAP -- Exhibition
PECIPTA 2007
spellingShingle Mask
E-beam lithography (EBL)
EBL System
UniMAP -- Research and development
UniMAP -- Exhibition
PECIPTA 2007
Uda, Hashim, Prof. Dr.
Nur Hamidah, Abdul Halim
Mohamad Nuzaihan, Md Nor
Zul Azhar, Zahid Jamal, Prof. Dr.
Mask Making Process (Positive and Negative Mask)
description PECIPTA 2007 dianjurkan oleh Kementerian Pengajian Tinggi Malaysia (KPTM) dengan kerjasama Universiti Sains Malaysia (USM) pada 10 - 12 Ogos 2007 di Pusat Konvensyen Kuala Lumpur (KLCC), Kuala Lumpur.
author2 uda@unimap.edu.my
author_facet uda@unimap.edu.my
Uda, Hashim, Prof. Dr.
Nur Hamidah, Abdul Halim
Mohamad Nuzaihan, Md Nor
Zul Azhar, Zahid Jamal, Prof. Dr.
format Image
author Uda, Hashim, Prof. Dr.
Nur Hamidah, Abdul Halim
Mohamad Nuzaihan, Md Nor
Zul Azhar, Zahid Jamal, Prof. Dr.
author_sort Uda, Hashim, Prof. Dr.
title Mask Making Process (Positive and Negative Mask)
title_short Mask Making Process (Positive and Negative Mask)
title_full Mask Making Process (Positive and Negative Mask)
title_fullStr Mask Making Process (Positive and Negative Mask)
title_full_unstemmed Mask Making Process (Positive and Negative Mask)
title_sort mask making process (positive and negative mask)
publisher Kementerian Pengajian Tinggi Malaysia (KPTM)
publishDate 2010
url http://dspace.unimap.edu.my/xmlui/handle/123456789/8172
_version_ 1643789086266228736
score 13.214268

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