Holdings: Wettability analysis on platinum deposited wafer after reactive ion ecthing using SF6+argon/CF4+argon gaseous

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Bibliographic Details
Main Authors:	Retnasamy, Vithyacharan, Zaliman, Sauli, Dr., Aaron, Koay Terr Yeow, Goh, Siew Chui, Kamarudin, Hussin, Brig. Jen. Dato' Prof. Dr.
Other Authors:	vc.sundress@gmail.com
Format:	Article
Language:	English
Published:	AENSI Publisher All rights reserved 2014
Subjects:	Contact angle DOE Platinum RIE Wetability
Online Access:	http://dspace.unimap.edu.my:80/dspace/handle/123456789/35122
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