Surface roughness scrutinizaton with RIE CF₄+Argon gaseous on platinum deposited wafer

• Main Authors: Zaliman, Sauli, Dr., Retnasamy, Vithyacharan, Aaron, Koay Terr Yeow, Siew Chui, Goh, Khairul Anwar, Mohamad Khazali, Nooraihan, Abdullah
• Other Authors: [e-mail]
• Format: Article
• Language: English
• Published: Trans Tech Publications 2014
• Subjects: CF₄+Argon; DOE; Platinum; Reactive Ion Etching (RIE); Surface roughness
• Online Access: http://dspace.unimap.edu.my:80/dspace/handle/123456789/33657

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