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Electron and ion densities measurement in reactive magnetron zinc sputtering plasma

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Main Authors: Nafarizal, Nayan, Mohd Zainizan, Sahdan, Riyaz Ahmad, Mohamad Ali, Sharifah Amira, Salwa, Omar, Mohamad Hafiz, Mamat, Uda, Hashim, Prof. Dr., Mohamad Rusop, Mahmood
Other Authors: nafa@uthm.edu.my
Format: Article
Language:English
Published: Trans Tech Publications 2014
Subjects:
Langmuir probe measurement
Zinc magnetron sputtering plasma
ZnO thin film
Online Access:http://dspace.unimap.edu.my:80/dspace/handle/123456789/33563
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spelling my.unimap-335632014-04-09T07:26:13Z Electron and ion densities measurement in reactive magnetron zinc sputtering plasma Nafarizal, Nayan Mohd Zainizan, Sahdan Riyaz Ahmad, Mohamad Ali Sharifah Amira Salwa, Omar Mohamad Hafiz, Mamat Uda, Hashim, Prof. Dr. Mohamad Rusop, Mahmood nafa@uthm.edu.my zainizan@uthm.edu.my riyaz@uthm.edu.my miraz_071187@yahoo.com salwaomar87@yahoo.com hafiz_030@yahoo.com rusop8@gmail.com uda@unimap.edu.my Langmuir probe measurement Zinc magnetron sputtering plasma ZnO thin film Link to publisher's homepage at http://www.ttp.net/ Investigation on the plasma properties is an essential fundamental works in order to precisely control the growth of nanoscale thin film. In the present work, we produced and study the reactive magnetron sputtering plasma in Ar+O2 ambient using a solid Zn target as sputter source. We evaluate the electron temperature, electron density and ion density using Langmuir probe measurement as a function of O2 flow rate and working pressure. We found that the electron temperature increased spontaneously with the oxygen flow rate. The electron temperature was almost doubled when O2 flow rate increased from 0 sccm to 10 sccm. The electron and ion densities increased with the oxygen flow rate between 0 sccm and 5 sccm. However, after 5 sccm of O2 flow rate which is approximately 11% of O2/(O2+Ar) flow rate ratio the electron density decreased drastically. This is due to the electron attachment and the production of negative ion species in Ar+O2 plasma environment. In addition, we found that the ion flux increase monotonically with the O2 flow rate thus will increase the ion bombardment effect on the deposited thin film and eventually damage the thin film. Our experimental results suggest that the O2 flow rate and the working pressure would have a significant influence on ion bombardment effect on deposited thin film. 2014-04-09T07:26:13Z 2014-04-09T07:26:13Z 2014 Article Advanced Materials Research, vol.832, 2014, pages 344-349 1662-8985 http://dspace.unimap.edu.my:80/dspace/handle/123456789/33563 http://www.scientific.net/AMR.832.344 10.4028/www.scientific.net/AMR.832.344 en Trans Tech Publications
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Langmuir probe measurement
Zinc magnetron sputtering plasma
ZnO thin film
spellingShingle Langmuir probe measurement
Zinc magnetron sputtering plasma
ZnO thin film
Nafarizal, Nayan
Mohd Zainizan, Sahdan
Riyaz Ahmad, Mohamad Ali
Sharifah Amira
Salwa, Omar
Mohamad Hafiz, Mamat
Uda, Hashim, Prof. Dr.
Mohamad Rusop, Mahmood
Electron and ion densities measurement in reactive magnetron zinc sputtering plasma
description Link to publisher's homepage at http://www.ttp.net/
author2 nafa@uthm.edu.my
author_facet nafa@uthm.edu.my
Nafarizal, Nayan
Mohd Zainizan, Sahdan
Riyaz Ahmad, Mohamad Ali
Sharifah Amira
Salwa, Omar
Mohamad Hafiz, Mamat
Uda, Hashim, Prof. Dr.
Mohamad Rusop, Mahmood
format Article
author Nafarizal, Nayan
Mohd Zainizan, Sahdan
Riyaz Ahmad, Mohamad Ali
Sharifah Amira
Salwa, Omar
Mohamad Hafiz, Mamat
Uda, Hashim, Prof. Dr.
Mohamad Rusop, Mahmood
author_sort Nafarizal, Nayan
title Electron and ion densities measurement in reactive magnetron zinc sputtering plasma
title_short Electron and ion densities measurement in reactive magnetron zinc sputtering plasma
title_full Electron and ion densities measurement in reactive magnetron zinc sputtering plasma
title_fullStr Electron and ion densities measurement in reactive magnetron zinc sputtering plasma
title_full_unstemmed Electron and ion densities measurement in reactive magnetron zinc sputtering plasma
title_sort electron and ion densities measurement in reactive magnetron zinc sputtering plasma
publisher Trans Tech Publications
publishDate 2014
url http://dspace.unimap.edu.my:80/dspace/handle/123456789/33563
_version_ 1643797212855009280
score 13.214268

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