Fabrication of silicon nanowires by electron beam lithography and thermal oxidation size reduction method
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2014
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my.unimap-335532014-04-09T06:24:03Z Fabrication of silicon nanowires by electron beam lithography and thermal oxidation size reduction method Mohammad Nuzaihan, Md Nor Uda, Hashim, Prof. Dr. Nazwa, Taib Tijjani Adam, Shuwa m.nuzaihan@unimap.edu.my uda@unimap.edu.my nazawa_nice@yahoo.com tijjaniadam@yahoo.com Advance nanolithography Atomic force microscopy (AFM) BOE EBL Inductively coupled plasma-reactive ion etching ma-N2400 negative resist Silicon nanowire Size-reduction Thermal oxidation Link to publisher's homepage at http://www.ttp.net/ A simple method for the fabrication of silicon nanowires using Electron Beam Lithography (EBL) combined with thermal oxidation size reduction method is presented. EBL is used to define the initial silicon nanowires of dimensions approximately 100 nm. Size-reduction method is employed for reaching true nanoscale of dimensions approximately 20 nm. Dry oxidation of silicon is well investigated process for self-limited size-reduction of silicon nanowires. In this paper, successful size reduction of silicon nanowires is presented and surface topography characterizations using Atomic Force Microscopy (AFM) are reported. 2014-04-09T06:24:03Z 2014-04-09T06:24:03Z 2014 Article Advanced Materials Research, vol.832, 2014, pages 415-418 1662-8985 http://dspace.unimap.edu.my:80/dspace/handle/123456789/33553 http://www.scientific.net/AMR.832.415 10.4028/www.scientific.net/AMR.832.415 en Trans Tech Publications |
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Advance nanolithography Atomic force microscopy (AFM) BOE EBL Inductively coupled plasma-reactive ion etching ma-N2400 negative resist Silicon nanowire Size-reduction Thermal oxidation |
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Advance nanolithography Atomic force microscopy (AFM) BOE EBL Inductively coupled plasma-reactive ion etching ma-N2400 negative resist Silicon nanowire Size-reduction Thermal oxidation Mohammad Nuzaihan, Md Nor Uda, Hashim, Prof. Dr. Nazwa, Taib Tijjani Adam, Shuwa Fabrication of silicon nanowires by electron beam lithography and thermal oxidation size reduction method |
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Link to publisher's homepage at http://www.ttp.net/ |
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m.nuzaihan@unimap.edu.my |
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m.nuzaihan@unimap.edu.my Mohammad Nuzaihan, Md Nor Uda, Hashim, Prof. Dr. Nazwa, Taib Tijjani Adam, Shuwa |
format |
Article |
author |
Mohammad Nuzaihan, Md Nor Uda, Hashim, Prof. Dr. Nazwa, Taib Tijjani Adam, Shuwa |
author_sort |
Mohammad Nuzaihan, Md Nor |
title |
Fabrication of silicon nanowires by electron beam lithography and thermal oxidation size reduction method |
title_short |
Fabrication of silicon nanowires by electron beam lithography and thermal oxidation size reduction method |
title_full |
Fabrication of silicon nanowires by electron beam lithography and thermal oxidation size reduction method |
title_fullStr |
Fabrication of silicon nanowires by electron beam lithography and thermal oxidation size reduction method |
title_full_unstemmed |
Fabrication of silicon nanowires by electron beam lithography and thermal oxidation size reduction method |
title_sort |
fabrication of silicon nanowires by electron beam lithography and thermal oxidation size reduction method |
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Trans Tech Publications |
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2014 |
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http://dspace.unimap.edu.my:80/dspace/handle/123456789/33553 |
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1643797208980520960 |
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13.214268 |