Optimization on oxidation process using 2K factorial design method

Silicon technologies progress in the last twenty years has traced the path to the unprecedented revolution of information technologies, which has changed everybody’s lifestyles. With the help of software, the world of technology can be improve and get even better. In this project, design of exper...

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Main Author: Yeap Li Chian
Other Authors: Noraini Othman (Advisor)
Format: Learning Object
Language:English
Published: Universiti Malaysia Perlis 2008
Subjects:
Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/2010
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spelling my.unimap-20102008-09-09T06:46:24Z Optimization on oxidation process using 2K factorial design method Yeap Li Chian Noraini Othman (Advisor) Silicon Oxidation Silicon dioxide Silicon oxidation Design of Experiment (DOE) Silicon technologies progress in the last twenty years has traced the path to the unprecedented revolution of information technologies, which has changed everybody’s lifestyles. With the help of software, the world of technology can be improve and get even better. In this project, design of experiments (DOE) is applied to oxidation process optimization. Oxidation process is one of the important processes in wafer fabrication. With different application required, different oxide thickness can be done. To give an accurate oxide thickness, DOE can help. This project study the concept of DOE in applies to oxidation process. The parameter of oxidation is studied and result validated on both practical and generated. With the 2K factorial design method, the experiments designed, conducted and analysis done for optimization. Result from experiment will be considering its pure error to obtain an optimum parameter. Finally, the oxidation process will be conduct using the optimum parameter. For this project, with 1054ºC, 35 minutes should built 4000Å oxide thickness but the real time experiment is getting 3700.5Å oxide thickness. From here, the different of practical result and theoretical result can be notified. The percentage error also calculated as about 8%. Generally, the real time experiment will not run too far from the theoretical. The small percentages error is due to the environment and human error problem when we conduct experiments. It is reasonable results because the optimum parameter generated by the software has been adjust to round number for easy experimentation. 2008-09-09T06:46:24Z 2008-09-09T06:46:24Z 2008-04 Learning Object http://hdl.handle.net/123456789/2010 en Universiti Malaysia Perlis School of Microelectronic Engineering
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Silicon
Oxidation
Silicon dioxide
Silicon oxidation
Design of Experiment (DOE)
spellingShingle Silicon
Oxidation
Silicon dioxide
Silicon oxidation
Design of Experiment (DOE)
Yeap Li Chian
Optimization on oxidation process using 2K factorial design method
description Silicon technologies progress in the last twenty years has traced the path to the unprecedented revolution of information technologies, which has changed everybody’s lifestyles. With the help of software, the world of technology can be improve and get even better. In this project, design of experiments (DOE) is applied to oxidation process optimization. Oxidation process is one of the important processes in wafer fabrication. With different application required, different oxide thickness can be done. To give an accurate oxide thickness, DOE can help. This project study the concept of DOE in applies to oxidation process. The parameter of oxidation is studied and result validated on both practical and generated. With the 2K factorial design method, the experiments designed, conducted and analysis done for optimization. Result from experiment will be considering its pure error to obtain an optimum parameter. Finally, the oxidation process will be conduct using the optimum parameter. For this project, with 1054ºC, 35 minutes should built 4000Å oxide thickness but the real time experiment is getting 3700.5Å oxide thickness. From here, the different of practical result and theoretical result can be notified. The percentage error also calculated as about 8%. Generally, the real time experiment will not run too far from the theoretical. The small percentages error is due to the environment and human error problem when we conduct experiments. It is reasonable results because the optimum parameter generated by the software has been adjust to round number for easy experimentation.
author2 Noraini Othman (Advisor)
author_facet Noraini Othman (Advisor)
Yeap Li Chian
format Learning Object
author Yeap Li Chian
author_sort Yeap Li Chian
title Optimization on oxidation process using 2K factorial design method
title_short Optimization on oxidation process using 2K factorial design method
title_full Optimization on oxidation process using 2K factorial design method
title_fullStr Optimization on oxidation process using 2K factorial design method
title_full_unstemmed Optimization on oxidation process using 2K factorial design method
title_sort optimization on oxidation process using 2k factorial design method
publisher Universiti Malaysia Perlis
publishDate 2008
url http://dspace.unimap.edu.my/xmlui/handle/123456789/2010
_version_ 1643787529907863552
score 13.222552