Comments: Theoretical study, simulation & fabrication of Dry Oxidation in terms of SiO2 layer thickness, resistivity & surface roughness

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Bibliographic Details
Main Author:	Mohd Adam Alias
Other Authors:	Ruslinda A. Rahim (Advisor)
Format:	Learning Object
Language:	English
Published:	Universiti Malaysia Perlis 2008
Subjects:	Oxidation Silicon > Oxidation Silicon oxide Semiconductor wafers Microelectronics Silicon
Online Access:	http://dspace.unimap.edu.my/xmlui/handle/123456789/1995
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