Description: Study of the effect of different Gases parameter in Dry Etching process on Etch Rate profile

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Bibliographic Details
Main Author:	Zaharah Mohamed
Other Authors:	Nur Juliana Juhari (Advisor)
Format:	Learning Object
Language:	English
Published:	Universiti Malaysia Perlis 2008
Subjects:	Semiconductors > Etching Plasma etching Silicon oxide Semiconductors > Design and construction Integrated circuits
Online Access:	http://dspace.unimap.edu.my/xmlui/handle/123456789/1993
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Summary:	Access is limited to UniMAP community.