Characterization of pMosfet degradation in negative bias temperature instability test / Soon Foo Yew

Threshold voltage instability has become a major IC reliability concern for sub-micron CMOS process technology. In the past, VTH Stability test is commonly used by the wafer fabrication plant to have a quick assessment on this reliability concern during process qualification, due to its simple te...

Full description

Saved in:
Bibliographic Details
Main Author: Soon, Foo Yew
Format: Thesis
Published: 2012
Subjects:
Online Access:http://studentsrepo.um.edu.my/8383/6/Dissertation%2DNBTI%2DFinal.pdf
http://studentsrepo.um.edu.my/8383/
Tags: Add Tag
No Tags, Be the first to tag this record!