Negative bias temperature instability and permittivity dependent delay mitigation in High-K metal oxide compatible cmos dielectric / Nissar Mohammad Karim
Negative Bias Temperature Instability (NBTI) and oxide delay are considered as threats to Complementary Metal Oxide Semiconductor (CMOS) transistors. Improving these issues result in improved performance in terms of reliability. In this thesis, to ensure reliability in transistors, the results on th...
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Format: | Thesis |
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2015
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Online Access: | http://studentsrepo.um.edu.my/7563/4/Final_Submission_Nissar_KHA110002.pdf http://studentsrepo.um.edu.my/7563/ |
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