Ammonia flux tailoring on the quality of AlN epilayers grown by pulsed atomic-layer epitaxy techniques on (0 0 0 1)-oriented sapphire substrates via MOCVD

• Main Authors: Abd Rahman, Mohd Nazri, Talik, Noor Azrina, Abdul Khudus, Muhammad Imran Mustafa, Sulaiman, Abdullah Fadil, Allif, Kamarul, Zahir, Norhilmi Mohd, Shuhaimi, Ahmad
• Format: Article
• Published: Royal Society of Chemistry 2019
• Subjects: Q Science (General); QC Physics
• Online Access: http://eprints.um.edu.my/24246/; https://doi.org/10.1039/C9CE00014C

A smooth and dense surface of single-crystalline aluminium nitride thin films has been epitaxially grown on (0 0 0 1)-sapphire substrates by tailoring and optimizing the ammonia flux density during deposition. The aluminium nitride films were deposited by metal organic chemical vapour deposition usi...