The study on the aspect ratio of Atomic Force Microscope (AFM) measurements for Triangular Silicon Nanowire
A top-down silicon nanowire fabrication using a combination of optical lithography and orientation dependent etching (ODE) has been developed using <100> Silicon-on Insulator (SOI) as the starting substrate. The use of ODE etchant such as potassium hydroxide (KOH) and Tetra-Methyl Ammonium H...
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Main Authors: | , , |
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Format: | Conference or Workshop Item |
Language: | English English |
Published: |
2013
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Online Access: | http://irep.iium.edu.my/33715/1/1569793019_The_Study_on_the_Aspect_Ratio_of_AFM_Measurements_for_Triangular_Si_NW.pdf http://irep.iium.edu.my/33715/4/IEEE-presentation_schedule.pdf http://irep.iium.edu.my/33715/ http://www.ieeemalaysia-eds.org/rsm2013/index.php?option=com_content&view=article&id=46:2013-ieee-regional-symposium-on-micro-and-nanoelectronics&Itemid=28 |
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