Metal oxide-graphene field-effect transistor: interface trap density extraction model

A simple to implement model is presented to extract interface trap density of graphene field effect transistors. The presence of interface trap states detrimentally affects the device drain current-gate voltage relationship Ids-Vgs. At the moment, there is no analytical method available to extract t...

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Main Authors: Najam, F., Lau, K. C., Lim, C. S., Yu, Y. S., Tan, M. L. P.
Format: Article
Language:English
Published: Beilstein-Institut Zur Forderung der Chemischen Wissenschaften 2016
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Online Access:http://eprints.utm.my/id/eprint/72074/1/FarazNajam2016_MetalOxideGrapheneFieldEffectTransistor.pdf
http://eprints.utm.my/id/eprint/72074/
https://www.scopus.com/inward/record.uri?eid=2-s2.0-84990842235&doi=10.3762%2fbjnano.7.128&partnerID=40&md5=b4b0ca42f1c9cb625791d0d644f9e2cf
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spelling my.utm.720742017-11-21T08:17:11Z http://eprints.utm.my/id/eprint/72074/ Metal oxide-graphene field-effect transistor: interface trap density extraction model Najam, F. Lau, K. C. Lim, C. S. Yu, Y. S. Tan, M. L. P. TK Electrical engineering. Electronics Nuclear engineering A simple to implement model is presented to extract interface trap density of graphene field effect transistors. The presence of interface trap states detrimentally affects the device drain current-gate voltage relationship Ids-Vgs. At the moment, there is no analytical method available to extract the interface trap distribution of metal-oxide-graphene field effect transistor (MOGFET) devices. The model presented here extracts the interface trap distribution of MOGFET devices making use of available experimental capacitance-gate voltage Ctot-Vgs data and a basic set of equations used to define the device physics of MOGFET devices. The model was used to extract the interface trap distribution of 2 experimental devices. Device parameters calculated using the extracted interface trap distribution from the model, including surface potential, interface trap charge and interface trap capacitance compared very well with their respective experimental counterparts. The model enables accurate calculation of the surface potential affected by trap charge. Other models ignore the effect of trap charge and only calculate the ideal surface potential. Such ideal surface potential when used in a surface potential based drain current model will result in an inaccurate prediction of the drain current. Accurate calculation of surface potential that can later be used in drain current model is highlighted as a major advantage of the model. Beilstein-Institut Zur Forderung der Chemischen Wissenschaften 2016 Article PeerReviewed application/pdf en http://eprints.utm.my/id/eprint/72074/1/FarazNajam2016_MetalOxideGrapheneFieldEffectTransistor.pdf Najam, F. and Lau, K. C. and Lim, C. S. and Yu, Y. S. and Tan, M. L. P. (2016) Metal oxide-graphene field-effect transistor: interface trap density extraction model. Beilstein Journal of Nanotechnology, 7 . pp. 1368-1376. ISSN 2190-4286 https://www.scopus.com/inward/record.uri?eid=2-s2.0-84990842235&doi=10.3762%2fbjnano.7.128&partnerID=40&md5=b4b0ca42f1c9cb625791d0d644f9e2cf
institution Universiti Teknologi Malaysia
building UTM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Teknologi Malaysia
content_source UTM Institutional Repository
url_provider http://eprints.utm.my/
language English
topic TK Electrical engineering. Electronics Nuclear engineering
spellingShingle TK Electrical engineering. Electronics Nuclear engineering
Najam, F.
Lau, K. C.
Lim, C. S.
Yu, Y. S.
Tan, M. L. P.
Metal oxide-graphene field-effect transistor: interface trap density extraction model
description A simple to implement model is presented to extract interface trap density of graphene field effect transistors. The presence of interface trap states detrimentally affects the device drain current-gate voltage relationship Ids-Vgs. At the moment, there is no analytical method available to extract the interface trap distribution of metal-oxide-graphene field effect transistor (MOGFET) devices. The model presented here extracts the interface trap distribution of MOGFET devices making use of available experimental capacitance-gate voltage Ctot-Vgs data and a basic set of equations used to define the device physics of MOGFET devices. The model was used to extract the interface trap distribution of 2 experimental devices. Device parameters calculated using the extracted interface trap distribution from the model, including surface potential, interface trap charge and interface trap capacitance compared very well with their respective experimental counterparts. The model enables accurate calculation of the surface potential affected by trap charge. Other models ignore the effect of trap charge and only calculate the ideal surface potential. Such ideal surface potential when used in a surface potential based drain current model will result in an inaccurate prediction of the drain current. Accurate calculation of surface potential that can later be used in drain current model is highlighted as a major advantage of the model.
format Article
author Najam, F.
Lau, K. C.
Lim, C. S.
Yu, Y. S.
Tan, M. L. P.
author_facet Najam, F.
Lau, K. C.
Lim, C. S.
Yu, Y. S.
Tan, M. L. P.
author_sort Najam, F.
title Metal oxide-graphene field-effect transistor: interface trap density extraction model
title_short Metal oxide-graphene field-effect transistor: interface trap density extraction model
title_full Metal oxide-graphene field-effect transistor: interface trap density extraction model
title_fullStr Metal oxide-graphene field-effect transistor: interface trap density extraction model
title_full_unstemmed Metal oxide-graphene field-effect transistor: interface trap density extraction model
title_sort metal oxide-graphene field-effect transistor: interface trap density extraction model
publisher Beilstein-Institut Zur Forderung der Chemischen Wissenschaften
publishDate 2016
url http://eprints.utm.my/id/eprint/72074/1/FarazNajam2016_MetalOxideGrapheneFieldEffectTransistor.pdf
http://eprints.utm.my/id/eprint/72074/
https://www.scopus.com/inward/record.uri?eid=2-s2.0-84990842235&doi=10.3762%2fbjnano.7.128&partnerID=40&md5=b4b0ca42f1c9cb625791d0d644f9e2cf
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score 13.160551