Explicit continuous charge-based compact model for long channel heavily doped surrounding-gate MOSFETs incorporating interface traps and quantum effects

An explicit solution for long-channel surrounding-gate (SRG) MOSFETs is presented from intrinsic to heavily doped body including the effects of interface traps and fixed oxide charges. The solution is based on the core SRGMOSFETs model of the Unified Charge Control Model (UCCM) for heavily doped con...

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Main Authors: Hamzah, A., Hamid, F. A., Ismail, R.
Format: Article
Published: Institute of Physics Publishing 2016
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Online Access:http://eprints.utm.my/id/eprint/71902/
https://www.scopus.com/inward/record.uri?eid=2-s2.0-84997207377&doi=10.1088%2f0268-1242%2f31%2f12%2f125020&partnerID=40&md5=4edc43c1a67b7d33599eca63daf56f54
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spelling my.utm.719022017-11-23T01:37:07Z http://eprints.utm.my/id/eprint/71902/ Explicit continuous charge-based compact model for long channel heavily doped surrounding-gate MOSFETs incorporating interface traps and quantum effects Hamzah, A. Hamid, F. A. Ismail, R. TK Electrical engineering. Electronics Nuclear engineering An explicit solution for long-channel surrounding-gate (SRG) MOSFETs is presented from intrinsic to heavily doped body including the effects of interface traps and fixed oxide charges. The solution is based on the core SRGMOSFETs model of the Unified Charge Control Model (UCCM) for heavily doped conditions. The UCCM model of highly doped SRGMOSFETs is derived to obtain the exact equivalent expression as in the undoped case. Taking advantage of the undoped explicit charge-based expression, the asymptotic limits for below threshold and above threshold have been redefined to include the effect of trap states for heavily doped cases. After solving the asymptotic limits, an explicit mobile charge expression is obtained which includes the trap state effects. The explicit mobile charge model shows very good agreement with respect to numerical simulation over practical terminal voltages, doping concentration, geometry effects, and trap state effects due to the fixed oxide charges and interface traps. Then, the drain current is obtained using the Pao-Sah's dual integral, which is expressed as a function of inversion charge densities at the source/drain ends. The drain current agreed well with the implicit solution and numerical simulation for all regions of operation without employing any empirical parameters. A comparison with previous explicit models has been conducted to verify the competency of the proposed model with the doping concentration of , as the proposed model has better advantages in terms of its simplicity and accuracy at a higher doping concentration. Institute of Physics Publishing 2016 Article PeerReviewed Hamzah, A. and Hamid, F. A. and Ismail, R. (2016) Explicit continuous charge-based compact model for long channel heavily doped surrounding-gate MOSFETs incorporating interface traps and quantum effects. Semiconductor Science and Technology, 31 (12). ISSN 0268-1242 https://www.scopus.com/inward/record.uri?eid=2-s2.0-84997207377&doi=10.1088%2f0268-1242%2f31%2f12%2f125020&partnerID=40&md5=4edc43c1a67b7d33599eca63daf56f54
institution Universiti Teknologi Malaysia
building UTM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Teknologi Malaysia
content_source UTM Institutional Repository
url_provider http://eprints.utm.my/
topic TK Electrical engineering. Electronics Nuclear engineering
spellingShingle TK Electrical engineering. Electronics Nuclear engineering
Hamzah, A.
Hamid, F. A.
Ismail, R.
Explicit continuous charge-based compact model for long channel heavily doped surrounding-gate MOSFETs incorporating interface traps and quantum effects
description An explicit solution for long-channel surrounding-gate (SRG) MOSFETs is presented from intrinsic to heavily doped body including the effects of interface traps and fixed oxide charges. The solution is based on the core SRGMOSFETs model of the Unified Charge Control Model (UCCM) for heavily doped conditions. The UCCM model of highly doped SRGMOSFETs is derived to obtain the exact equivalent expression as in the undoped case. Taking advantage of the undoped explicit charge-based expression, the asymptotic limits for below threshold and above threshold have been redefined to include the effect of trap states for heavily doped cases. After solving the asymptotic limits, an explicit mobile charge expression is obtained which includes the trap state effects. The explicit mobile charge model shows very good agreement with respect to numerical simulation over practical terminal voltages, doping concentration, geometry effects, and trap state effects due to the fixed oxide charges and interface traps. Then, the drain current is obtained using the Pao-Sah's dual integral, which is expressed as a function of inversion charge densities at the source/drain ends. The drain current agreed well with the implicit solution and numerical simulation for all regions of operation without employing any empirical parameters. A comparison with previous explicit models has been conducted to verify the competency of the proposed model with the doping concentration of , as the proposed model has better advantages in terms of its simplicity and accuracy at a higher doping concentration.
format Article
author Hamzah, A.
Hamid, F. A.
Ismail, R.
author_facet Hamzah, A.
Hamid, F. A.
Ismail, R.
author_sort Hamzah, A.
title Explicit continuous charge-based compact model for long channel heavily doped surrounding-gate MOSFETs incorporating interface traps and quantum effects
title_short Explicit continuous charge-based compact model for long channel heavily doped surrounding-gate MOSFETs incorporating interface traps and quantum effects
title_full Explicit continuous charge-based compact model for long channel heavily doped surrounding-gate MOSFETs incorporating interface traps and quantum effects
title_fullStr Explicit continuous charge-based compact model for long channel heavily doped surrounding-gate MOSFETs incorporating interface traps and quantum effects
title_full_unstemmed Explicit continuous charge-based compact model for long channel heavily doped surrounding-gate MOSFETs incorporating interface traps and quantum effects
title_sort explicit continuous charge-based compact model for long channel heavily doped surrounding-gate mosfets incorporating interface traps and quantum effects
publisher Institute of Physics Publishing
publishDate 2016
url http://eprints.utm.my/id/eprint/71902/
https://www.scopus.com/inward/record.uri?eid=2-s2.0-84997207377&doi=10.1088%2f0268-1242%2f31%2f12%2f125020&partnerID=40&md5=4edc43c1a67b7d33599eca63daf56f54
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score 13.160551