Relationship between precursor gas flow rate with the structural and morphology properties of diamond like carbon films
Diamond like carbon (DLC) thin films were grown onto glass substrates by using direct current plasma enhance chemical vapour deposition (DC-PECVD) system. Films were deposited under fixed deposition pressure (4 × 10-1 Torr), substrate temperature (500 °C) and deposition time (3 hours) but with diffe...
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フォーマット: | 論文 |
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Trans Tech Publications
2014
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オンライン・アクセス: | http://eprints.utm.my/id/eprint/62428/ http://dx.doi.org/10.4028/www.scientific.net/AMR.970.128 |
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