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Optical properties measurements of nanocrystalline silicon thin films

Nanocrystalline silicon (nc-Si) thin films on 7059 corning glass substrate were prepared using Very High Frequency Plasma-Enhanced Chemical Vapour Deposition (VHF-PECVD) at different deposition temperatures. The nc-Si properties film were analyzed using spectroscopic ellipsometer, ultra violet (UV-V...

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Bibliographic Details
Main Author: Gan, Chee Hong
Format: Thesis
Language:English
Published: 2011
Subjects:
Q Science (General)
Online Access:http://eprints.utm.my/id/eprint/33381/1/GanCheeHongMFS2011.pdf
http://eprints.utm.my/id/eprint/33381/
http://dms.library.utm.my:8080/vital/access/manager/Repository/vital:70042?queryType=vitalDismax&query=Optical+properties+measurements+of+nanocrystalline+silicon+thin+films&public=true
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http://eprints.utm.my/id/eprint/33381/1/GanCheeHongMFS2011.pdf
http://eprints.utm.my/id/eprint/33381/
http://dms.library.utm.my:8080/vital/access/manager/Repository/vital:70042?queryType=vitalDismax&query=Optical+properties+measurements+of+nanocrystalline+silicon+thin+films&public=true

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