Impact of the microwave power on the structural and optical properties of nanocrystalline nickel oxide thin films
Nanocrystalline nickel oxide thin films were prepared by combined techniques of direct current sputtering (DC sputtering) and microwave plasma chemical vapor deposition to perform high-quality films. The prepared films were subjected to three different microwave powers at 400, 800, and 1200 W. The s...
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| Main Authors: | , , , , , |
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| Format: | Article |
| Published: |
Springer
2021
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| Subjects: | |
| Online Access: | http://eprints.um.edu.my/28326/ |
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