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Ultra-sharp pointed tip Si nanowires produced by very high frequency plasma enhanced chemical vapor deposition via VLS mechanism

Needle-like silicon nanowires have been grown using gold colloid as the catalyst and silane (SiH4) as the precursor by very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD). Si nanowires produced by this method were unique with sharpness below 3 nm. High resolution transmission e...

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Main Authors: Wahab, Yussof, Othaman, Zulkafli, Hamidinezhad, Habib
Format: Article
Published: Springer 2011
Subjects:
TP Chemical technology
Online Access:http://eprints.utm.my/id/eprint/29904/
http://dx.doi.org/10.1007/s10853-011-5435-6
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spelling my.utm.299042020-10-22T04:07:01Z http://eprints.utm.my/id/eprint/29904/ Ultra-sharp pointed tip Si nanowires produced by very high frequency plasma enhanced chemical vapor deposition via VLS mechanism Wahab, Yussof Othaman, Zulkafli Hamidinezhad, Habib TP Chemical technology Needle-like silicon nanowires have been grown using gold colloid as the catalyst and silane (SiH4) as the precursor by very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD). Si nanowires produced by this method were unique with sharpness below 3 nm. High resolution transmission electron microscopy (HRTEM) and X-ray diffraction technique (XRD) confirmed the single crystalline growth of the Si nanowires with (111) crystalline structure. Raman spectroscopy also has revealed the presence of crystalline Si in the grown Si nanowire body. In this research, presence of a gold nanoparticle on tip of the nanowires proved vapor–liquid–solid growth mechanism. Springer 2011-08 Article PeerReviewed Wahab, Yussof and Othaman, Zulkafli and Hamidinezhad, Habib (2011) Ultra-sharp pointed tip Si nanowires produced by very high frequency plasma enhanced chemical vapor deposition via VLS mechanism. Journal of Materials Science, 46 (15). pp. 5085-5089. ISSN 0022-2461 http://dx.doi.org/10.1007/s10853-011-5435-6 DOI:10.1007/s10853-011-5435-6
institution Universiti Teknologi Malaysia
building UTM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Teknologi Malaysia
content_source UTM Institutional Repository
url_provider http://eprints.utm.my/
topic TP Chemical technology
spellingShingle TP Chemical technology
Wahab, Yussof
Othaman, Zulkafli
Hamidinezhad, Habib
Ultra-sharp pointed tip Si nanowires produced by very high frequency plasma enhanced chemical vapor deposition via VLS mechanism
description Needle-like silicon nanowires have been grown using gold colloid as the catalyst and silane (SiH4) as the precursor by very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD). Si nanowires produced by this method were unique with sharpness below 3 nm. High resolution transmission electron microscopy (HRTEM) and X-ray diffraction technique (XRD) confirmed the single crystalline growth of the Si nanowires with (111) crystalline structure. Raman spectroscopy also has revealed the presence of crystalline Si in the grown Si nanowire body. In this research, presence of a gold nanoparticle on tip of the nanowires proved vapor–liquid–solid growth mechanism.
format Article
author Wahab, Yussof
Othaman, Zulkafli
Hamidinezhad, Habib
author_facet Wahab, Yussof
Othaman, Zulkafli
Hamidinezhad, Habib
author_sort Wahab, Yussof
title Ultra-sharp pointed tip Si nanowires produced by very high frequency plasma enhanced chemical vapor deposition via VLS mechanism
title_short Ultra-sharp pointed tip Si nanowires produced by very high frequency plasma enhanced chemical vapor deposition via VLS mechanism
title_full Ultra-sharp pointed tip Si nanowires produced by very high frequency plasma enhanced chemical vapor deposition via VLS mechanism
title_fullStr Ultra-sharp pointed tip Si nanowires produced by very high frequency plasma enhanced chemical vapor deposition via VLS mechanism
title_full_unstemmed Ultra-sharp pointed tip Si nanowires produced by very high frequency plasma enhanced chemical vapor deposition via VLS mechanism
title_sort ultra-sharp pointed tip si nanowires produced by very high frequency plasma enhanced chemical vapor deposition via vls mechanism
publisher Springer
publishDate 2011
url http://eprints.utm.my/id/eprint/29904/
http://dx.doi.org/10.1007/s10853-011-5435-6
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score 13.160551

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