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TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films

The nanostructural characteristics of direct-current magnetron sputter-deposited Ni4Al alloy films were studied during in situ isothermal annealing in a transmission electron microscope. An expansion of the lattice by nearly 5% was observed for the Ni0.8Al0.2 films in their low-thickness and as-depo...

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Main Author: T., Joseph Sahaya Anand
Format: Conference or Workshop Item
Language:English
English
Published: 2011
Subjects:
TJ Mechanical engineering and machinery
Online Access:http://eprints.utem.edu.my/id/eprint/10147/1/SJC_Invited.pdf
http://eprints.utem.edu.my/id/eprint/10147/2/SJC_Invited.pdf
http://eprints.utem.edu.my/id/eprint/10147/
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spelling my.utem.eprints.101472015-05-28T04:09:24Z http://eprints.utem.edu.my/id/eprint/10147/ TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films T., Joseph Sahaya Anand TJ Mechanical engineering and machinery The nanostructural characteristics of direct-current magnetron sputter-deposited Ni4Al alloy films were studied during in situ isothermal annealing in a transmission electron microscope. An expansion of the lattice by nearly 5% was observed for the Ni0.8Al0.2 films in their low-thickness and as-deposited state. The lattice size approaches the bulk value when the film thickness increases or after vacuum annealing heat-treatment. The Ni0.8Al0.2 films have a nanocrystalline structure in which the ordered L12 phase appears upon annealing at above 500°C. The ordered B2 phase Ni4Al phase with orthorhombic structure were found. 2011-01 Conference or Workshop Item PeerReviewed text/html en http://eprints.utem.edu.my/id/eprint/10147/1/SJC_Invited.pdf application/pdf en http://eprints.utem.edu.my/id/eprint/10147/2/SJC_Invited.pdf T., Joseph Sahaya Anand (2011) TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films. In: International Conference on Nanotechnology and Ultrasound, 12 - 14 January 2011, Tiruchirapalli, INDIA.
institution Universiti Teknikal Malaysia Melaka
building UTEM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Teknikal Malaysia Melaka
content_source UTEM Institutional Repository
url_provider http://eprints.utem.edu.my/
language English
English
topic TJ Mechanical engineering and machinery
spellingShingle TJ Mechanical engineering and machinery
T., Joseph Sahaya Anand
TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films
description The nanostructural characteristics of direct-current magnetron sputter-deposited Ni4Al alloy films were studied during in situ isothermal annealing in a transmission electron microscope. An expansion of the lattice by nearly 5% was observed for the Ni0.8Al0.2 films in their low-thickness and as-deposited state. The lattice size approaches the bulk value when the film thickness increases or after vacuum annealing heat-treatment. The Ni0.8Al0.2 films have a nanocrystalline structure in which the ordered L12 phase appears upon annealing at above 500°C. The ordered B2 phase Ni4Al phase with orthorhombic structure were found.
format Conference or Workshop Item
author T., Joseph Sahaya Anand
author_facet T., Joseph Sahaya Anand
author_sort T., Joseph Sahaya Anand
title TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films
title_short TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films
title_full TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films
title_fullStr TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films
title_full_unstemmed TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films
title_sort tem studies of sputter-deposited ni4al alloy thin films
publishDate 2011
url http://eprints.utem.edu.my/id/eprint/10147/1/SJC_Invited.pdf
http://eprints.utem.edu.my/id/eprint/10147/2/SJC_Invited.pdf
http://eprints.utem.edu.my/id/eprint/10147/
_version_ 1665905413419171840
score 13.18916

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