TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films
The nanostructural characteristics of direct-current magnetron sputter-deposited Ni4Al alloy films were studied during in situ isothermal annealing in a transmission electron microscope. An expansion of the lattice by nearly 5% was observed for the Ni0.8Al0.2 films in their low-thickness and as-depo...
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| Format: | Conference or Workshop Item |
| Language: | English English |
| Published: |
2011
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| Subjects: | |
| Online Access: | http://eprints.utem.edu.my/id/eprint/10147/1/SJC_Invited.pdf http://eprints.utem.edu.my/id/eprint/10147/2/SJC_Invited.pdf http://eprints.utem.edu.my/id/eprint/10147/ |
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| Summary: | The nanostructural characteristics of direct-current magnetron sputter-deposited Ni4Al alloy films were studied during in situ isothermal annealing in a transmission electron microscope. An expansion of the lattice by nearly 5% was observed for the Ni0.8Al0.2 films in their low-thickness and as-deposited state. The lattice size approaches the bulk value when the film thickness increases or after vacuum annealing heat-treatment. The Ni0.8Al0.2 films have a nanocrystalline structure in which the ordered L12 phase appears upon annealing at above 500°C. The ordered B2 phase Ni4Al phase with orthorhombic structure were found. |
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