Investigation of low dielectric constant (k) films for deep sub-micron CMOS application.
Silica (Si02) thin film on Si with low dielectric constant (k) properties has been systematically prepared and investigated. Two types of this low-k material have been deposited on Si via sol-gel spin-on coating. Filem nipis silika (Si02) yang berpemalar dieletrik rendah endap di atas Si tlah dis...
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| Main Authors: | , |
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| Format: | Monograph |
| Published: |
Universiti Sains Malaysia
2007
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| Subjects: | |
| Online Access: | http://eprints.usm.my/10419/ |
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