Characterization and optimizations of silicide thickness in 45nm pMOS device
The characteristics of high performance 45nm pMOS devices based on International Technology Roadmap for Semiconductor (ITRS) have been studied using ATHENA and ATLAS's simulator. There are four factors were varied for 3 levels to perform 9 experiments. The factors are halo implantation, Source/...
Saved in:
| Main Authors: | , , , |
|---|---|
| Format: | Conference Proceeding |
| Published: |
2017
|
| Online Access: | http://dspace.uniten.edu.my:80/jspui/handle/123456789/5252 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|