Analysis the effect of control factors optimization on the threshold voltage of 18 nm PMOS using L27 taguchi method
This research paper is about the investigation of Halo Implantation, Halo Implantation Energy, Halo Tilt, Compensation Implantation and Source/Drain Implantation. They are types of control factors that used in achievement of the threshold voltage value. To support the successfully of the threshold v...
Saved in:
| Main Authors: | , , , |
|---|---|
| 其他作者: | |
| 格式: | Article |
| 出版: |
Institute of Advanced Engineering and Science
2023
|
| 标签: |
添加标签
没有标签, 成为第一个标记此记录!
|