Analysis the effect of control factors optimization on the threshold voltage of 18 nm PMOS using L27 taguchi method

• المؤلفون الرئيسيون: Bte Atanb N., Majlis B.Y., Ahmad I., Chong K.H.
• مؤلفون آخرون: 57201393384
• التنسيق: مقال
• منشور في: Institute of Advanced Engineering and Science 2023

This research paper is about the investigation of Halo Implantation, Halo Implantation Energy, Halo Tilt, Compensation Implantation and Source/Drain Implantation. They are types of control factors that used in achievement of the threshold voltage value. To support the successfully of the threshold v...