CdS film thickness characterization by R.F. magnetron sputtering
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American Institute of Physics
2010
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my.unimap-87952010-08-18T01:49:31Z CdS film thickness characterization by R.F. magnetron sputtering Uda, Hashim, Prof. Dr. Kasim, Abdul Rahman Hakim Mohd Azri, Othman Cadmium sulphide (CdS) Resistivity RF magnetron sputtering X-ray diffraction Malaysian Technical Universities Conference on Engineering and Technology (MUCEET) Link to publisher's homepage at http://www.aip.org/ In this work, cadmium sulphide (CdS) target with 99.999% purity was used as a target in RF magnetron sputtering. The sputtering experiment was conducted onto silicon oxide substrates at different temperatures ranging from 200°C to 400°C in 50°C steps, using a capacitive coupled magnetron cathode with 13.65 MHz that at higher magnetron power. After all investigations, it was concluded that 300°C substrate temperature is suitable for producing CdS films on silicon wafer with RF magnetron sputtering and the examined properties (good crystallinity and low resistivity) of this film show its feasibility for technological purposes, especially for light sensor cells. 2010-08-18T01:49:31Z 2010-08-18T01:49:31Z 2009-06-01 Working Paper Vol.1136, 2009, p. 253-258 0094-243X http://link.aip.org/link/?APCPCS/1136/253/1 http://hdl.handle.net/123456789/8795 en Proceedings of the International Conference on Nanoscience and Nanotechnology 2008 American Institute of Physics |
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English |
| topic |
Cadmium sulphide (CdS) Resistivity RF magnetron sputtering X-ray diffraction Malaysian Technical Universities Conference on Engineering and Technology (MUCEET) |
| spellingShingle |
Cadmium sulphide (CdS) Resistivity RF magnetron sputtering X-ray diffraction Malaysian Technical Universities Conference on Engineering and Technology (MUCEET) Uda, Hashim, Prof. Dr. Kasim, Abdul Rahman Hakim Mohd Azri, Othman CdS film thickness characterization by R.F. magnetron sputtering |
| description |
Link to publisher's homepage at http://www.aip.org/ |
| format |
Working Paper |
| author |
Uda, Hashim, Prof. Dr. Kasim, Abdul Rahman Hakim Mohd Azri, Othman |
| author_facet |
Uda, Hashim, Prof. Dr. Kasim, Abdul Rahman Hakim Mohd Azri, Othman |
| author_sort |
Uda, Hashim, Prof. Dr. |
| title |
CdS film thickness characterization by R.F. magnetron sputtering |
| title_short |
CdS film thickness characterization by R.F. magnetron sputtering |
| title_full |
CdS film thickness characterization by R.F. magnetron sputtering |
| title_fullStr |
CdS film thickness characterization by R.F. magnetron sputtering |
| title_full_unstemmed |
CdS film thickness characterization by R.F. magnetron sputtering |
| title_sort |
cds film thickness characterization by r.f. magnetron sputtering |
| publisher |
American Institute of Physics |
| publishDate |
2010 |
| url |
http://dspace.unimap.edu.my/xmlui/handle/123456789/8795 |
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1643789208794431488 |
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13.214268 |