Man-2403 resist development for electron beam lithography process

• Main Authors: Nur Hamidah, Abdul Halim, Uda, Hashim, Prof. Dr., Mohammad Nuzaihan, Md Nor
• Format: Working Paper
• Language: English
• Published: Universiti Malaysia Pahang 2010
• Subjects: E-beam lithography; Resist development; maN-2403; Malaysian Technical Universities Conference on Engineering and Technology (MUCEET)
• Online Access: http://dspace.unimap.edu.my/xmlui/handle/123456789/8646

Malaysian Technical Universities Conference on Engineering and Technology organized by Universiti Malaysia Pahang in collaboration with Universiti Tun Hussein Onn Malaysia, Universiti Teknikal Malaysia Melaka & Universiti Malaysia Perlis on June 20th - 22nd, 2009, at MS Garden Hotel, Kuantan, P...