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Man-2403 resist development for electron beam lithography process

Malaysian Technical Universities Conference on Engineering and Technology organized by Universiti Malaysia Pahang in collaboration with Universiti Tun Hussein Onn Malaysia, Universiti Teknikal Malaysia Melaka & Universiti Malaysia Perlis on June 20th - 22nd, 2009, at MS Garden Hotel, Kuantan, P...

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Main Authors: Nur Hamidah, Abdul Halim, Uda, Hashim, Prof. Dr., Mohammad Nuzaihan, Md Nor
Format: Working Paper
Language:English
Published: Universiti Malaysia Pahang 2010
Subjects:
E-beam lithography
Resist development
maN-2403
Malaysian Technical Universities Conference on Engineering and Technology (MUCEET)
Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/8646
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spelling my.unimap-86462010-08-13T04:50:02Z Man-2403 resist development for electron beam lithography process Nur Hamidah, Abdul Halim Uda, Hashim, Prof. Dr. Mohammad Nuzaihan, Md Nor E-beam lithography Resist development maN-2403 Malaysian Technical Universities Conference on Engineering and Technology (MUCEET) Malaysian Technical Universities Conference on Engineering and Technology organized by Universiti Malaysia Pahang in collaboration with Universiti Tun Hussein Onn Malaysia, Universiti Teknikal Malaysia Melaka & Universiti Malaysia Perlis on June 20th - 22nd, 2009, at MS Garden Hotel, Kuantan, Pahang, Malaysia. Line-width of resist patterns is more susceptible to the developing time than the thickness of the undeveloped resist. This project focused on the development of MaN-2403 resist for e-beam lithography process. The objective of this project is to observe the effect of exposure dose and development time to the physical structure of maN-2403 resist using scanning electron microscope (SEM) and atomic force microscopy (AFM). The incomplete development of exposed resist pattern caused bridging effect in ma-N2403 resist tone. 2010-08-13T04:50:02Z 2010-08-13T04:50:02Z 2009-06-20 Working Paper http://hdl.handle.net/123456789/8646 en Proceedings of the Malaysian Technical Universities Conference on Engineering and Technology (MUCEET) 2009 Universiti Malaysia Pahang
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic E-beam lithography
Resist development
maN-2403
Malaysian Technical Universities Conference on Engineering and Technology (MUCEET)
spellingShingle E-beam lithography
Resist development
maN-2403
Malaysian Technical Universities Conference on Engineering and Technology (MUCEET)
Nur Hamidah, Abdul Halim
Uda, Hashim, Prof. Dr.
Mohammad Nuzaihan, Md Nor
Man-2403 resist development for electron beam lithography process
description Malaysian Technical Universities Conference on Engineering and Technology organized by Universiti Malaysia Pahang in collaboration with Universiti Tun Hussein Onn Malaysia, Universiti Teknikal Malaysia Melaka & Universiti Malaysia Perlis on June 20th - 22nd, 2009, at MS Garden Hotel, Kuantan, Pahang, Malaysia.
format Working Paper
author Nur Hamidah, Abdul Halim
Uda, Hashim, Prof. Dr.
Mohammad Nuzaihan, Md Nor
author_facet Nur Hamidah, Abdul Halim
Uda, Hashim, Prof. Dr.
Mohammad Nuzaihan, Md Nor
author_sort Nur Hamidah, Abdul Halim
title Man-2403 resist development for electron beam lithography process
title_short Man-2403 resist development for electron beam lithography process
title_full Man-2403 resist development for electron beam lithography process
title_fullStr Man-2403 resist development for electron beam lithography process
title_full_unstemmed Man-2403 resist development for electron beam lithography process
title_sort man-2403 resist development for electron beam lithography process
publisher Universiti Malaysia Pahang
publishDate 2010
url http://dspace.unimap.edu.my/xmlui/handle/123456789/8646
_version_ 1643789245706403840
score 13.214268

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