PMMA characterization and optimization for Nano Structure formation

• المؤلفون الرئيسيون: S Niza, Mohammad Bajuri, Nur Hamidah, Abdul Halim, Mohammad Nuzaihan, Md Nor, Uda, Hashim
• التنسيق: Working Paper
• اللغة: English
• منشور في: Kolej Universiti Kejuruteraan Utara Malaysia 2009
• الموضوعات: Electron beam lithography; Resolution; Resists thickness; Polymethyl-Methacrylate (PMMA); Lithography, Electron beam; Beam energy; Nano structure
• الوصول للمادة أونلاين: http://dspace.unimap.edu.my/xmlui/handle/123456789/7102

Organized by Kolej Universiti Kejuruteraan Utara Malaysia (KUKUM), 18th - 19th May 2005 at Putra Palace Hotel, Kangar.