PMMA characterization and optimization for Nano Structure formation
Organized by Kolej Universiti Kejuruteraan Utara Malaysia (KUKUM), 18th - 19th May 2005 at Putra Palace Hotel, Kangar.
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Kolej Universiti Kejuruteraan Utara Malaysia
2009
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my.unimap-71022009-08-28T02:01:13Z PMMA characterization and optimization for Nano Structure formation S Niza, Mohammad Bajuri Nur Hamidah, Abdul Halim Mohammad Nuzaihan, Md Nor Uda, Hashim Electron beam lithography Resolution Resists thickness Polymethyl-Methacrylate (PMMA) Lithography, Electron beam Beam energy Nano structure Organized by Kolej Universiti Kejuruteraan Utara Malaysia (KUKUM), 18th - 19th May 2005 at Putra Palace Hotel, Kangar. The limitations imposed on optical lithography by the wavelength of light have been overcome using electron lithography. Electron lithography offers high resolution because of the small wavelength of the 10-50 keV electrons and not sensitive in near UV. The resolution of electron lithography systems is limited by electron scattering in the resist not by the diffraction. One of the limitations of the resolution is resist thickness besides of beam energy and substrate compositions. Resist thickness is controlled by many factors such as velocity of the spinner, solid content and the viscosity of the resist. The resist commonly used on electron lithography is PMMA or Polymethyl-Methacrylate. In this paper, the effect of three parameters (as concerned above) on resist thickness is focused. 2009-08-28T01:08:39Z 2009-08-28T01:08:39Z 2005-05-18 Working Paper p.81-83 http://hdl.handle.net/123456789/7102 en Proceedings of the 1st National Conference on Electronic Design Kolej Universiti Kejuruteraan Utara Malaysia |
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Asia |
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Malaysia |
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Universiti Malaysia Perlis |
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http://dspace.unimap.edu.my/ |
| language |
English |
| topic |
Electron beam lithography Resolution Resists thickness Polymethyl-Methacrylate (PMMA) Lithography, Electron beam Beam energy Nano structure |
| spellingShingle |
Electron beam lithography Resolution Resists thickness Polymethyl-Methacrylate (PMMA) Lithography, Electron beam Beam energy Nano structure S Niza, Mohammad Bajuri Nur Hamidah, Abdul Halim Mohammad Nuzaihan, Md Nor Uda, Hashim PMMA characterization and optimization for Nano Structure formation |
| description |
Organized by Kolej Universiti Kejuruteraan Utara Malaysia (KUKUM), 18th - 19th May 2005 at Putra Palace Hotel, Kangar. |
| format |
Working Paper |
| author |
S Niza, Mohammad Bajuri Nur Hamidah, Abdul Halim Mohammad Nuzaihan, Md Nor Uda, Hashim |
| author_facet |
S Niza, Mohammad Bajuri Nur Hamidah, Abdul Halim Mohammad Nuzaihan, Md Nor Uda, Hashim |
| author_sort |
S Niza, Mohammad Bajuri |
| title |
PMMA characterization and optimization for Nano Structure formation |
| title_short |
PMMA characterization and optimization for Nano Structure formation |
| title_full |
PMMA characterization and optimization for Nano Structure formation |
| title_fullStr |
PMMA characterization and optimization for Nano Structure formation |
| title_full_unstemmed |
PMMA characterization and optimization for Nano Structure formation |
| title_sort |
pmma characterization and optimization for nano structure formation |
| publisher |
Kolej Universiti Kejuruteraan Utara Malaysia |
| publishDate |
2009 |
| url |
http://dspace.unimap.edu.my/xmlui/handle/123456789/7102 |
| _version_ |
1643788685188005888 |
| score |
13.222552 |