Borophosphosilicate glass (BPSG) reflow characterization for submicron CMOS technology

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Main Authors: Uda, Hashim, Ramzan, Mat Ayub, Nik Hazura, Nik Hamat
Format: Article
Language:English
Published: Universiti Kebangsaan Malaysia 2009
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Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/6889
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spelling my.unimap-68892009-08-13T08:54:30Z Borophosphosilicate glass (BPSG) reflow characterization for submicron CMOS technology Uda, Hashim Ramzan, Mat Ayub Nik Hazura, Nik Hamat Borophosphosilicate glass Hydrofluoric acid staining Steam annealing Microelectronics -- Materials Integrated circuits -- Materials Metal oxide semiconductors, Complementary Link to publisher's homepage at http://pkukmweb.ukm.my/~jsm/ This paper involves the planarization of borophosphosilicate glass (BPSG) film using a new recipe for annealing process to improve the borophosphosilicate glass (BPSG) film flatness after reflow. This improvement is for 0.35μm technology using steam annealing method at different temperatures. This process allows the planarization of wafers with thin layer at its surface. In this paper we present the comparison between the effect of hydrofluoric acid (HF) staining on the cross sectional topography with the samples without hydrofluoric acid (HF) staining analyzed by field emission scanning electron microscopy (FESEM). We found that staining with HF produced clearer images. 2009-08-13T08:53:44Z 2009-08-13T08:53:44Z 2007 Article Sains Malaysiana, vol.36 (1), 2007, pages 53-57. 0126-6039 http://pkukmweb.ukm.my/~jsm/ http://hdl.handle.net/123456789/6889 en Universiti Kebangsaan Malaysia
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Borophosphosilicate glass
Hydrofluoric acid staining
Steam annealing
Microelectronics -- Materials
Integrated circuits -- Materials
Metal oxide semiconductors, Complementary
spellingShingle Borophosphosilicate glass
Hydrofluoric acid staining
Steam annealing
Microelectronics -- Materials
Integrated circuits -- Materials
Metal oxide semiconductors, Complementary
Uda, Hashim
Ramzan, Mat Ayub
Nik Hazura, Nik Hamat
Borophosphosilicate glass (BPSG) reflow characterization for submicron CMOS technology
description Link to publisher's homepage at http://pkukmweb.ukm.my/~jsm/
format Article
author Uda, Hashim
Ramzan, Mat Ayub
Nik Hazura, Nik Hamat
author_facet Uda, Hashim
Ramzan, Mat Ayub
Nik Hazura, Nik Hamat
author_sort Uda, Hashim
title Borophosphosilicate glass (BPSG) reflow characterization for submicron CMOS technology
title_short Borophosphosilicate glass (BPSG) reflow characterization for submicron CMOS technology
title_full Borophosphosilicate glass (BPSG) reflow characterization for submicron CMOS technology
title_fullStr Borophosphosilicate glass (BPSG) reflow characterization for submicron CMOS technology
title_full_unstemmed Borophosphosilicate glass (BPSG) reflow characterization for submicron CMOS technology
title_sort borophosphosilicate glass (bpsg) reflow characterization for submicron cmos technology
publisher Universiti Kebangsaan Malaysia
publishDate 2009
url http://dspace.unimap.edu.my/xmlui/handle/123456789/6889
_version_ 1643788616962408448
score 13.222552