Effect of alignment mark architecture on alignment signal behavior in advanced lithography

• Main Authors: Normah, Ahmad, Uda, Hashim, Mohd Jeffery, Manaf, Kader Ibrahim, Abdul Wahab
• 格式: Article
• 語言: English
• 出版: Universiti Malaya 2009
• 主題: Alignment mark; Alignment signal; Lithography; Lithography > Technique; Metal mark; Deposition
• 在線閱讀: http://dspace.unimap.edu.my/xmlui/handle/123456789/6836

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