Alignment mark architecture effect on alignment signal behavior in advanced lithography

• Main Authors: Normah, Ahmad, Uda, Hashim, Mohd Jeffrey, Manaf, Kader Ibrahim, Abdul Wahab
• Format: Article
• Language: English
• Published: Institute of Electrical and Electronics Engineering (IEEE) 2009
• Subjects: Alignment mark; Alignment signal; Lithography; CMOS integrated circuits; Metal oxide semiconductors, Complementary; Scanner alignment system
• Online Access: http://dspace.unimap.edu.my/xmlui/handle/123456789/6676

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