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Mask design and fabrication of Micro/Nanowire biochip for reliable and repeatability pattern transfer

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Main Authors: Veeradasan, Perumal, Uda, Hashim, Prof. Dr., Tijjani Adam, Shuwa
Other Authors: veerdasaan@hotmail.my
Format: Article
Language:English
Published: Trans Tech Publications 2014
Subjects:
Biochip
Critical dimension
Mask aligner
Microwire
Pattern transfer
Online Access:http://dspace.unimap.edu.my:80/dspace/handle/123456789/33542
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spelling my.unimap-335422014-04-09T04:00:03Z Mask design and fabrication of Micro/Nanowire biochip for reliable and repeatability pattern transfer Veeradasan, Perumal Uda, Hashim, Prof. Dr. Tijjani Adam, Shuwa veerdasaan@hotmail.my uda@unimap.edu.my tijjaniadam@yahoo.com Biochip Critical dimension Mask aligner Microwire Pattern transfer Link to publisher's homepage at http://www.ttp.net/ In Micro/Nanowire fabrication, the alignment and exposure process are the most critical steps in photolithography process, and indeed for the whole biochip processing. This process determines the success of transferring the Micro/Nanowire design pattern on the mask to the photoresists on the wafer surface. Hence, the resolution requirementsand precise alignment are vital; each mask needs to be precisely aligned with original alignment mark in order to transfer the original pattern from mask onto photoresist layer. Otherwise, itcant successfully transfer the original pattern to the wafer surface causing device and circuit failure. Therefore, the UniMAPs Second Generation Mask Aligner is used for precise alignment and pattern transfer process. Thus, the paper present a preliminary study on fundamentals of resist exposure and development mechanisms for fabrication of Micro/Nanowire, We demonstrated significance of considering process parameters such as mask aligner, quality of resist, soft bake, exposure time and intensity, and development time. There was a very little room for alignment error; we were able to achieved error free design to the criticaldimension. 2014-04-09T04:00:03Z 2014-04-09T04:00:03Z 2014 Article Advanced Materials Research, vol.832, 2014, pages 79-83 1662-8985 http://dspace.unimap.edu.my:80/dspace/handle/123456789/33542 http://www.scientific.net/AMR.832.79 10.4028/www.scientific.net/AMR.832.79 en Trans Tech Publications
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Biochip
Critical dimension
Mask aligner
Microwire
Pattern transfer
spellingShingle Biochip
Critical dimension
Mask aligner
Microwire
Pattern transfer
Veeradasan, Perumal
Uda, Hashim, Prof. Dr.
Tijjani Adam, Shuwa
Mask design and fabrication of Micro/Nanowire biochip for reliable and repeatability pattern transfer
description Link to publisher's homepage at http://www.ttp.net/
author2 veerdasaan@hotmail.my
author_facet veerdasaan@hotmail.my
Veeradasan, Perumal
Uda, Hashim, Prof. Dr.
Tijjani Adam, Shuwa
format Article
author Veeradasan, Perumal
Uda, Hashim, Prof. Dr.
Tijjani Adam, Shuwa
author_sort Veeradasan, Perumal
title Mask design and fabrication of Micro/Nanowire biochip for reliable and repeatability pattern transfer
title_short Mask design and fabrication of Micro/Nanowire biochip for reliable and repeatability pattern transfer
title_full Mask design and fabrication of Micro/Nanowire biochip for reliable and repeatability pattern transfer
title_fullStr Mask design and fabrication of Micro/Nanowire biochip for reliable and repeatability pattern transfer
title_full_unstemmed Mask design and fabrication of Micro/Nanowire biochip for reliable and repeatability pattern transfer
title_sort mask design and fabrication of micro/nanowire biochip for reliable and repeatability pattern transfer
publisher Trans Tech Publications
publishDate 2014
url http://dspace.unimap.edu.my:80/dspace/handle/123456789/33542
_version_ 1643797205712109568
score 13.160551

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