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Polysilicon nanogap fabrication using a thermal oxidation process

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Main Authors: Dhahi, T.S, Uda, Hashim, Prof. Dr., Md. Eaqub, Ali, Nazwa, Taib
Other Authors: sthikra@yahoo.com
Format: Article
Language:English
Published: Emerald Group Publishing Limited. 2013
Subjects:
Capacitance
Electrodes
Microelectronics
Nanogap
Nanotechnology
Photolithography
Physical characterization
Size reduction
Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/25642
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spelling my.unimap-256422013-06-10T07:46:16Z Polysilicon nanogap fabrication using a thermal oxidation process Dhahi, T.S Uda, Hashim, Prof. Dr. Md. Eaqub, Ali Nazwa, Taib sthikra@yahoo.com Capacitance Electrodes Microelectronics Nanogap Nanotechnology Photolithography Physical characterization Size reduction Link to publisher's homepage at http://www.emeraldinsight.com/ Purpose - Nanogap electrodes have important applications in power saving devices, electrochemical sensors and dielectric detections of biomolecules. The purpose of this paper is to report on the fabrication and characterization of polysilicon nanogap patterning using novelties technique. Design/methodology/ approach - Polysilicon material is used to fabricate the nanogap structure and gold is used for the electrode and two chrome masks are used to complete this work; the first mask for the nanogap pattern and a second mask for the electrode. The method is based on the control of the coefficients (temperature and time) with an improved pattern size resolution thermal oxidation. Findings - Physical characterization by scanning electron microscopy (SEM) demonstrates such nanogap electrodes could be produced with high reproducibility and precision. Electrical characterization shows that nanogap enhanced the sensitivity of the device by increase the capacitance and the conductivity as well. They have also good efficiency of power consumption with high insulation properties. Originality/value - With this technique, there are no principal limitations to fabricating nanostructures with different layouts down to several different nanometer dimensions. The paper documents the fabrication of nanogaps electrodes on a polysilicon, using low-cost techniques such as vacuum deposition and conventional lithography. Polysilicon is a low-cost materials and has desirable properties for semiconductor applications. A method of preparing a nanogap electrode according to the present innovation has an advantage of providing active surface that can easily be modified for immobilizations of biomolecules. 2013-06-10T07:46:16Z 2013-06-10T07:46:16Z 2012 Article Microelectronics International, vol. 29 (1), 2012, pages 40-46 1356-5362 http://www.emeraldinsight.com/journals.htm?articleid=17020779&show=abstract http://hdl.handle.net/123456789/25642 en Emerald Group Publishing Limited.
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Capacitance
Electrodes
Microelectronics
Nanogap
Nanotechnology
Photolithography
Physical characterization
Size reduction
spellingShingle Capacitance
Electrodes
Microelectronics
Nanogap
Nanotechnology
Photolithography
Physical characterization
Size reduction
Dhahi, T.S
Uda, Hashim, Prof. Dr.
Md. Eaqub, Ali
Nazwa, Taib
Polysilicon nanogap fabrication using a thermal oxidation process
description Link to publisher's homepage at http://www.emeraldinsight.com/
author2 sthikra@yahoo.com
author_facet sthikra@yahoo.com
Dhahi, T.S
Uda, Hashim, Prof. Dr.
Md. Eaqub, Ali
Nazwa, Taib
format Article
author Dhahi, T.S
Uda, Hashim, Prof. Dr.
Md. Eaqub, Ali
Nazwa, Taib
author_sort Dhahi, T.S
title Polysilicon nanogap fabrication using a thermal oxidation process
title_short Polysilicon nanogap fabrication using a thermal oxidation process
title_full Polysilicon nanogap fabrication using a thermal oxidation process
title_fullStr Polysilicon nanogap fabrication using a thermal oxidation process
title_full_unstemmed Polysilicon nanogap fabrication using a thermal oxidation process
title_sort polysilicon nanogap fabrication using a thermal oxidation process
publisher Emerald Group Publishing Limited.
publishDate 2013
url http://dspace.unimap.edu.my/xmlui/handle/123456789/25642
_version_ 1643794635030528000
score 13.222552

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