Optimization of 950K PMMA resists for Nano-application using Statistical Design Expert

• 主要作者: Khoo Chien Chin
• 其他作者: Uda Hashim, P.M. Dr. (Advisor)
• 格式: Learning Object
• 语言: English
• 出版: Universiti Malaysia Perlis 2008
• 主题: Lithography, Electron beam; Lithography; Polymethyl-methacrylate (PMMA; Lithography > Technique; Integrated circuits; Nanotechnology
• 在线阅读: http://dspace.unimap.edu.my/xmlui/handle/123456789/2390

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