Optimization of 950K PMMA resists for Nano-application using Statistical Design Expert

• المؤلف الرئيسي: Khoo Chien Chin
• مؤلفون آخرون: Uda Hashim, P.M. Dr. (Advisor)
• التنسيق: Learning Object
• اللغة: English
• منشور في: Universiti Malaysia Perlis 2008
• الموضوعات: Lithography, Electron beam; Lithography; Polymethyl-methacrylate (PMMA; Lithography > Technique; Integrated circuits; Nanotechnology
• الوصول للمادة أونلاين: http://dspace.unimap.edu.my/xmlui/handle/123456789/2390

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