Study on diffusivity of Gallium dopant in Silicon using Spin On Dopant (SOD) technique

• Main Author: Mohd Rosydi Zakaria
• Other Authors: Mohd Khairuddin Md Arshad (Advisor)
• Format: Learning Object
• Language: English
• Published: Universiti Malaysia Perlis 2008
• Subjects: Silicon; Semiconductors; Gallium; Spin On Dopant (SOD); Integrated circuits; MOS transistor
• Online Access: http://dspace.unimap.edu.my/xmlui/handle/123456789/1964

Diffusion and ion implantation are two major processes by which chemical species or dopant are introduced into a semiconductor such as silicon to form the electronic structure. The diffusion process is a method to control the thermal budget to expand performance device by combination of temperatur...