Description: The Effect of Process Parameters on Metal Step Coverage for Aluminum by Evaporation Technique

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Bibliographic Details
Main Author:	Noraishah Azman
Other Authors:	Ramzan Mat Ayub (Advisor)
Format:	Learning Object
Language:	English
Published:	Universiti Malaysia Perlis 2008
Subjects:	Very Large Scale Integration (VLSI) Electron Beam Lithography (EBL) Aluminium alloys Metal oxide semiconductors, Complementary Evaporation Semiconductor devices Integrated circuits
Online Access:	http://dspace.unimap.edu.my/xmlui/handle/123456789/1356
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Summary:	Access is limited to UniMAP community.