Effects of thermal annealing on the properties of highly reflective Nc-Si: H/A-Cnx: H multilayer films prepared by rf PECVD technique
The effects of thermal annealing in the range of 100-700°C on highly reflecting multilayer thin film consisting of 7 periods of alternating nc-Si:H/a-CNx:H layers prepared by radio-frequency plasma enhanced chemical vapour (r.f. PECVD) deposition technique were investigated. The films were deposite...
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Main Authors: | , , , , , |
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Format: | Article |
Language: | English |
Published: |
2011
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Subjects: | |
Online Access: | http://eprints.um.edu.my/7357/1/Effects_Of_Thermal_Annealing_On_The_Properties_Of_Highly_Reflective_Nc-Si_HA-Cnx_H_Multilayer_Films_Prepared_By_rf_PECVD_Technique.pdf http://eprints.um.edu.my/7357/ |
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