Influence of substrate and annealing temperatures on optical properties of RF-sputtered TiO2 thin films

• Main Authors: Hasan, M.M., Haseeb, A.S. Md. Abdul, Saidur, Rahman, Masjuki, Haji Hassan, Abd Shukor, Mohd Hamdi
• Format: Article
• Published: Elsevier 2010
• Subjects: TA Engineering (General). Civil engineering (General); TJ Mechanical engineering and machinery
• Online Access: http://eprints.um.edu.my/6766/; https://doi.org/10.1016/j.optmat.2009.07.011

TiO2 thin films were deposited on unheated and heated glass substrates at an elevated sputtering pressure of 3 Pa by radio frequency (RF) reactive magnetron sputtering. TiO2 films deposited at room temperature were annealed in air for 1 h at various temperatures ranging from 300 to 600 °C. The struc...