Physical vapour deposition of Zr-based nano films on various substrates: A review
Physical vapor deposition (PVD) is a thin film fabrication process in the semiconductor industry. This review paper discusses the different types of PVD methods such as sputtering, cathodic arc deposition, pulsed laser deposition, and ion plating that could be employed in order to fabricate nanoscal...
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| Main Authors: | , , , |
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| Format: | Article |
| Published: |
Bentham Science Publishers
2022
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| Subjects: | |
| Online Access: | http://eprints.um.edu.my/41798/ |
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