Physical vapour deposition of Zr-based nano films on various substrates: A review

Physical vapor deposition (PVD) is a thin film fabrication process in the semiconductor industry. This review paper discusses the different types of PVD methods such as sputtering, cathodic arc deposition, pulsed laser deposition, and ion plating that could be employed in order to fabricate nanoscal...

Full description

Saved in:
Bibliographic Details
Main Authors: Tarek, Ahmad Hafiz Jafarul, Lai, Chin Wei, Abdul Razak, Bushroa, Wong, Yew Hoong
Format: Article
Published: Bentham Science Publishers 2022
Subjects:
Online Access:http://eprints.um.edu.my/41798/
Tags: Add Tag
No Tags, Be the first to tag this record!