Agglomeration enhancement of AlN surface diffusion fluxes on a (0001)-sapphire substrate grown by pulsed atomic-layer epitaxy techniques via MOCVD

• Main Authors: Abd Rahman, Mohd Nazri, Yusuf, Yusnizam, Anuar, Afiq, Mahat, Mohamad Raqif, Chanlek, Narong, Talik, Noor Azrina, Abdul Khudus, Muhammad Imran Mustafa, Zainal, Norzaini, Abd Majid, Wan Haliza, Shuhaimi, Ahmad
• Format: Article
• Published: Royal Society of Chemistry 2020
• Subjects: QD Chemistry
• Online Access: http://eprints.um.edu.my/36683/

An atomically flat covering with a dense and crack-free surface of aluminium nitride films was successfully deposited on a sapphire-(0 0 0 1) substrate through a pulsed atomic-layer epitaxy technique via horizontal metalorganic chemical vapour deposition. The distribution of surface diffusion energy...