Dynamic dispersing technique for PR coating process in planar lightwave circuit fabrication
A new dynamic dispersing technique (DDT) is proposed and demonstrated to improve the photoresist (PR) coating process in planar lightwave circuit (PLC) fabrication. In this technique, the PR is dispensed during the wafer's spin cycle on the spin coaler instead of the conventional static dispens...
Saved in:
Main Authors: | Pua, Chang Hong, Harun, Sulaiman Wadi, Chong, Wu Yi, Jayapalan, Kanesh Kumar, Ahmad, Harith |
---|---|
格式: | Article |
出版: |
John Wiley & Sons
2007
|
主题: | |
在线阅读: | http://eprints.um.edu.my/19681/ http://dx.doi.org/10.1002/mop.22609 |
标签: |
添加标签
没有标签, 成为第一个标记此记录!
|
相似书籍
-
Inductively coupled plasma dry etching process on planar lightwave circuit fabrication / Chuah Khoon Seah
由: Chuah, Khoon Seah
出版: (2010) -
Low-loss compact waveguiding with te modes in metal/dielectric waveguides for planar lightwave circuit / Mohd Zulkifli Chik
由: Chik, Mohd Zulkifli
出版: (2010) -
Light, Lightwave and System : a Malaysian Perspective
由: Ahmad, Harith
出版: (2005) -
Methodology for Fabrication-Tolerant Planar Directional Couplers
由: Lai, Choon Kong, et al.
出版: (2022) -
A Space Dilated Lightwave Network-A New Approach
由: Suliman, F.M., et al.
出版: (2003)